钴
计时安培法
线性扫描伏安法
沉积(地质)
沟槽
材料科学
氢
循环伏安法
化学工程
化学
纳米技术
图层(电子)
冶金
电化学
电极
物理化学
地质学
有机化学
古生物学
沉积物
工程类
作者
Jungkyu Kang,Minjae Sung,Jinuk Byun,Oh Joong Kwon,Jae Jeong Kim
标识
DOI:10.1149/1945-7111/abd3b9
摘要
In this study, superconformal cobalt filling of submicron trenches by electrodeposition is investigated in the presence of 2-mercaptobenzimidazole (MBI), which suppresses both cobalt deposition and the hydrogen evolution reaction (HER). The mechanism through which this single additive enables superconformal cobalt filling is investigated. The formation and breakdown of the suppression layer are characterized by linear sweep voltammetry and chronoamperometry. The convection-driven local concentration of MBI exerts different suppressing effects on cobalt reduction and the HER, leading to a change in the deposition rate and the current efficiency of cobalt. These phenomena induce a deposition rate differential between the top and bottom of the submicron trench, enabling bottom-up cobalt filling with a V-shape profile.
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