石墨烯
材料科学
拉曼光谱
化学气相沉积
电子迁移率
载流子密度
石墨烯纳米带
光电子学
分析化学(期刊)
纳米技术
光学
兴奋剂
色谱法
物理
化学
作者
Jeong-Yuan Hwang,Chun-Chiang Kuo,Li‐Chyong Chen,Kuei‐Hsien Chen
出处
期刊:Nanotechnology
[IOP Publishing]
日期:2010-10-25
卷期号:21 (46): 465705-465705
被引量:101
标识
DOI:10.1088/0957-4484/21/46/465705
摘要
We report a correlation between carrier mobility and defect density in large-scaled graphene films prepared by chemical vapor deposition (CVD). Raman spectroscopy is used for investigating the layer number and the crystal quality of graphene films, and the defect density is estimated by the intensity ratios of the D and G peaks. By carefully controlling the growth parameters, especially the H2/CH4 ratios during growth, and employing H2 during cooling, monolayer-dominant graphene films can be obtained with different D peak intensities in Raman spectra, which show good correspondence with their carrier mobility obtained by Hall measurements. Also, a progressive shift of neutrality points to a more negative gate voltage is observed with the increase in defect density. Both the connections of carrier mobility and the shift of neutrality points to a negative direction in relation to the defect density in graphene are observed for the first time in CVD-grown graphene films. With the best growth conditions, a cm-scaled graphene film with carrier mobility of ∼ 1350 cm2 V − 1 s − 1 (p-type in air) can be obtained.
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