硼化物
渗硼
材料科学
络腮胡子
冶金
合金
图层(电子)
硼
扩散
基质(水族馆)
复合材料
化学
热力学
物理
海洋学
有机化学
地质学
作者
Delai Ouyang,Sheng-wei HU,Tao Cheng,Xia Cui,Zhishou Zhu,Shiqiang Lu
标识
DOI:10.1016/s1003-6326(21)65761-8
摘要
The influence of the boriding conditions on the boride layers was examined by boriding Ti−6Al−2Zr− 1Mo−1V alloy in the temperature range of 920−1120°C. The experimental results show that the boride layers were composed of a continuous thin outer layer of TiB2 and a thick inner layer of TiB with whiskers or needle-like morphologies that extended into the substrate. Thick and compact boride layers were obtained when the boriding temperatures were 1000−1080 °C, and the treatment time exceeded 8 h. The boride layer depth increased with the boriding temperature and time, and the growth kinetics of the boride layers was characterized by a parabolic curve. The growth kinetics of the boride layers, including both TiB2 and TiB layers, were predicted by establishing a diffusion model, which presented satisfactory consistency with the experimental data. As a result, the activation energies of boron in the TiB2 and TiB layers were estimated to be 223.1 and 246.9 kJ/mol, respectively.
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