神经形态工程学
记忆电阻器
材料科学
长时程增强
锡
光电子学
突触重量
期限(时间)
记忆晶体管
计算机科学
电阻随机存取存储器
脉搏(音乐)
人工神经网络
电子工程
电压
电气工程
物理
人工智能
化学
电信
探测器
工程类
受体
冶金
量子力学
生物化学
作者
Jiho Ryu,Chandreswar Mahata,Sungjun Kim
标识
DOI:10.1016/j.jallcom.2020.156675
摘要
Here in, we introduce a Pt/Ta2O5/HfO2/TiN memristor with enhanced resistive switching behavior, these conductive effects were induced by inserting a HfO2 layer. We demonstrate that the uniform switching performance of the Pt/Ta2O5/HfO2/TiN device comes from the construction and destruction of oxygen vacancies (ion generation) in the HfO2 film. Low-power response of the analog conductance changes with different dynamic synaptic characteristics were demonstrated, which included paired-pulse depression (PPD), long-term potentiation (LTP), long-term depression (LTD), and spike timing-dependent plasticity (STDP). This was achieved by the proper adjustment of pulse amplitude, width and interval. Furthermore, the pattern recognition accuracy of a system was evaluated which composed in the device by forming a 3-layer neural network (784 × 128 × 10) with Ta2O5/HfO2 based memristor synapses. The experimental research with proposed Pt/Ta2O5/HfO2/TiN memristor provides valuable insight for the optimization of synaptic performances to use in futuristic neuromorphic applications.
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