石墨烯
光电发射电子显微术
角分辨光电子能谱
材料科学
光电发射光谱学
低能电子显微镜
拉曼光谱
石墨烯纳米带
显微镜
光学
光电子学
纳米技术
电子结构
电子显微镜
凝聚态物理
X射线光电子能谱
核磁共振
物理
作者
Falk Niefind,Henry G. Bell,T. Thuc,Angela R. Hight Walker,Randolph E. Elmquist,Sujitra Pookpanratana
摘要
A photoemission electron microscope (PEEM) was recently commissioned at the NIST. To benchmark its capabilities, epitaxial graphene on 4H-SiC (0001) was imaged and analyzed in the PEEM and compared to other complementary imaging techniques. We determine our routine spatial resolution to be about 50 nm. Using the well-known electronic structure of graphene as a reference, we outline a procedure to calibrate our instrument in energy and momenta in the micrometer-angle-resolved photoemission spectroscopy (μ-ARPES). We also determine the energy and momenta resolution to be about 300 meV, 0.08 Å−1 (ky), and 0.2 Å−1 (kx), respectively. We identify distinct regions of the graphene surface based on intensity contrast rising from topographic and electronic contrasts as well as μ-ARPES. These regions are one layer graphene, one SiC buffer layer, and ≥2 layers of graphene (or graphite). These assignments are confirmed using confocal laser scanning microscopy and Raman spectroscopy. Finally, the PEEM instrument had enough sensitivity to observe the flatband in monolayer epitaxial graphene, which we attribute to the presence of compressive strain, −1.2%, in the graphene sample.
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