氧化银
材料科学
薄膜
电阻率和电导率
折射率
溅射沉积
氧化物
溅射
分析化学(期刊)
光电子学
氧气
苏打石灰玻璃
矿物学
化学
纳米技术
复合材料
冶金
有机化学
工程类
色谱法
电气工程
作者
Ullash Kumar Barik,S. K. Srinivasan,C. L. Nagendra,A. Subrahmanyam
标识
DOI:10.1016/s0040-6090(03)00064-6
摘要
Silver oxide thin films have been prepared on soda lime glass substrates at room temperature (300 K) by reactive DC Magnetron sputtering technique using pure silver metal target; the oxygen flow rates have been varied in the range 0.00–2.01 sccm. The X-ray diffraction data on these films show a systematic change from metallic silver to silver (sub) oxides. The electrical resistivity increases with increasing oxygen flow. The films show a p-type behavior (by both Hall and Seebeck measurements) for the oxygen flow rates of 0.54, 1.09 and 1.43 sccm. The refractive index of the films (at 632.8 nm) decreases with increasing oxygen content and is in the range 1.167–1.145, whereas the p-type films show a higher refractive index (1.186–1.204). The work function of these silver oxide films has been measured by Kelvin Probe technique. The results, in specific, the p-type conductivity in the silver oxide films, have been explained on the basis of the theory of partial ionic charge proposed by Sanderson.
科研通智能强力驱动
Strongly Powered by AbleSci AI