余辉
二极管
激进的
光谱学
吸收(声学)
动力学
等离子体
分析化学(期刊)
材料科学
吸收光谱法
化学
气相
发光二极管
原子物理学
光电子学
光学
物理
物理化学
量子力学
复合材料
有机化学
色谱法
伽马射线暴
天文
摘要
Measuring decay rates of radical densities in the afterglow of pulsed plasmas is a powerful approach to determine their gas phase and surface loss kinetics. We show that this measurement can be achieved by absorption spectroscopy with low cost and simple apparatus by using light emitting diodes as a light source. The feasibility is demonstrated by monitoring BCl radicals in pulsed low pressure high-density BCl3 plasmas. It is shown that BCl is lost both in the gas phase by reacting with Cl2 with a cross section of 9 Å2 and in the chamber walls with a sticking coefficient of about 0.3.
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