短路
瞬态(计算机编程)
高电子迁移率晶体管
材料科学
薄脆饼
等效电路
电压
电子工程
光电子学
电气工程
工程类
计算机科学
晶体管
操作系统
作者
Injun Hwang,Soogine Chong,Dong‐Chul Shin,Sun-Kyu Hwang,Younghwan Park,Boram Kim,Joonyong Kim,Jaejoon Oh,Jun Hyuk Park,Min Chul Yu,Woochul Jeon,Jai Kwang Shin,Jongseob Kim
标识
DOI:10.1109/led.2021.3090341
摘要
Wafer level transient voltage measurement (WLTVM) to estimate the short circuit capability of AlGaN/GaN HEMT devices is suggested. Two groups of samples with similar DC and switching properties but different short circuit capabilities of 4-7 and > 10μs were evaluated. The extracted junction temperature and the measured saturation/linear current under repeated short circuit stresses suggest that the short circuit failure is attributed to the degradation in the drift region. The WLTVM could measure the transient potential change along the drift region during short circuit condition. The sample with lower short-circuit survivability showed a faster propagation of the high field traveling from the gate to the drain. The time the high electric field reaches the drain coincides with the time of the short circuit failure. In addition to providing the insight into the short circuit failure mechanism, wafer-level method can provide a quick and non-destructive evaluation of the short circuit capability before packaging devices.
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