激光线宽
材料科学
光学
激光器
脉冲持续时间
激光束质量
皮秒
放大器
紫外线
光电子学
梁(结构)
激光束
物理
CMOS芯片
作者
Yosuke Orii,Kenta Kohno,Hiroki Tanaka,Masashi Yoshimura,Yusuke Mori,Junichi Nishimae,Kimihiko Shibuya
出处
期刊:Optics Express
[Optica Publishing Group]
日期:2022-03-17
卷期号:30 (7): 11797-11797
被引量:17
摘要
We report 10,000-hour stable operation of a 266-nm picosecond laser with an average power of 20 W. We have developed a narrow-linewidth, high-peak-power 1064-nm laser source with a repetition rate of 600 kHz, an average power of 129 W, a linewidth of 0.15 nm, and a pulse duration of 14 ps using a gain-switched DFB-LD as a picosecond pulse seed source and a four-stage power amplifier with an Nd:YVO4 crystal. A 266-nm laser with a maximum average power of 25.4 W was generated by frequency conversion using LBO and CLBO crystals and had a pulse duration of 8 ps and beam quality factor of 1.5 at 20W. To the best of our knowledge, we also demonstrated that the average power and the beam quality can be maintained for 10,000 hours for the first time. We have confirmed the durability of the developed deep ultraviolet laser for industrial applications.
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