高电子迁移率晶体管
材料科学
逻辑门
宽禁带半导体
氮化镓
光电子学
电子工程
拓扑(电路)
晶体管
电气工程
工程类
电压
纳米技术
图层(电子)
作者
Shuo Zhang,Chang Liu,Xinyu Li,Desheng Zhang,Yuxiang Yang,Run Min,Qiaoling Tong,Han Peng
标识
DOI:10.1109/tpel.2024.3501362
摘要
The fast switching of gallium nitride high mobility transistor (GaN HEMT) results in high dv/dt and severe EMI issues, requiring a trade-off with the switching power loss. Three-stage gate drive (TSGD) can mitigate the conflict between switching speed and losses, but it is challenging to achieve minimal switching loss under the existing TSGD strategy due to the nonlinear parasitic capacitance of GaN HEMT. To address this issue, this article proposes a minimal switching loss TSGD strategy based on a dynamic dv/dt switching (DVTS) model, which can achieve minimal switching loss. First, based on the charge conservation principle, piecewise linear equivalent values for the parasitic capacitances of GaN HEMT are calculated. Based on the result, analytical expressions for the transient voltage and current in each switching stage are derived, which forms the DVTS model and provides detailed analysis for the dv/dt nonlinearity. Furthermore, analytical expressions for switching loss during each stage are calculated, establishing the quantitative relationship between switching loss and drive conditions. By minimizing the total loss, the required driving currents and switching timings are determined. Finally, the MSL-TSGD strategy is proposed. Experimental results demonstrate that the proposed method reduces the turn-on loss by 18.6%, and reduces the turn-on delay by 29.3%.
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