极紫外光刻
放气
等离子体
铝
氢
X射线光电子能谱
材料科学
光谱学
散射
原子物理学
化学
光学
物理
纳米技术
冶金
核物理学
核磁共振
有机化学
量子力学
作者
Kleopatra Papamichou,Thomas Mechielsen,Aneta Stodólna,Erik Schuring,Henk A. Lensen
摘要
With increasing source powers the interaction between so called EUV-generated hydrogen plasma and construction materials of EUV lithography machines becomes more important. Here we present an experimental study on the interaction between EUV photons and/or hydrogen plasma with a selected construction material, aluminium. In a series of experiments performed in off-line plasma setups we investigated hydrogen induced outgassing (HIO) processes from aluminium. Various techniques like X-ray Photoelectron Spectroscopy, Time-off-flight Secondary Ions Mass Spectroscopy, and Hydrogen Forward Scattering are used to track changes in aluminium.
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