MOSFET
功率MOSFET
材料科学
沟槽
负偏压温度不稳定性
屏蔽电缆
电气工程
不稳定性
浅沟隔离
热不稳定性
光电子学
电子工程
电压
工程类
机械
晶体管
物理
纳米技术
图层(电子)
作者
Xinyu Ren,Min Ren,Yining Wu,Chao Xu,Hongwei Zhou,Zehong Li,Bo Zhang
标识
DOI:10.1109/ipfa55383.2022.9915722
摘要
Shielded-gate Trench (SGT) MOSFET is widely used in the low-voltage field because of its low specific on resistance and gate-to-drain charge. Like most power MOSFETs, thermal instability reduces the safety operation area (SOA) of the SGT MOSFET. Failure of SGT MOSFET due to thermal instability is observed and the mechanism is studied in this paper. According to simulation, increasing the channel length is an effective means to improve thermal stability of SGT MOSFET. Therefore, the improved SGT MOSFETs, T-shaped gate SGT and L-shaped gate SGT, are proposed. The simulation results show that the improved structures can reduce the current corresponding to zero temperature coefficient by 50%.
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