中国
平版印刷术
路径(计算)
业务
国际贸易
纳米技术
材料科学
政治学
计算机科学
光电子学
法学
程序设计语言
作者
Yu‐Fen Chen,Junjie Huang
标识
DOI:10.1080/09537325.2025.2547823
摘要
Breaking through strategic technologies is crucial for the industrial upgrading and sustainable development for developing countries. Categorising China's lithography technology innovation from 2011 to 2021 into three stages (initial, development and critical), this study delves into the breakthrough path of Chinese listed companies in the field of lithography technology with COM-B (capability opportunity motivation-behaviour) framework. Three key findings are revealed. First, the combined effects of capability, opportunity and motivation can propel companies to accelerate lithography breakthrough, leading to a total of six breakthrough paths in the three stages. Second, the significance of dynamic capabilities in diverse dimensions varies during technological breakthroughs, with learning absorption capability standing out as a necessary condition in the critical stage. Third, appropriate government support can create a favourable opportunity for technological breakthroughs.
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