Latest progress on preparation of ferroelectric thin films prepared by MOCVD process

Ferroelectric thin films as an important functional material were recently one of the new/high-tech projects drawing extensive attention to study,to which the MOCVD(metal organic chemical vapour deposition) is an important process for preparation of ferroelectric films.Reviews the formation principle,process parameters and characteristics of the ferroelectric films by MOCVD especially the ferreelectric properties of some materials prepared by MOCVD.