欧姆接触
肖特基势垒
兴奋剂
半导体
金属半导体结
阻挡层
凝聚态物理
材料科学
肖特基二极管
肖特基效应
光电子学
图层(电子)
化学
纳米技术
物理
二极管
标识
DOI:10.1088/0268-1242/20/6/022
摘要
We discuss experimental properties and possibilities of the maximum barrier height assessment for low Schottky barrier heights which have apparently Ohmic I–V curves. It is shown that the usage of numerical methods for low barrier height parameters extraction is very useful. We discuss the properties of the Schottky contacts with the same barrier heights but different semiconductor doping concentrations. For such contacts there can be an accumulation or depletion layer at the semiconductor surface for the same barrier height depending on the doping concentration. I–V curves of such structures have similar character, but a rather large difference can be expected in C–V curves.
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