氢气储存
材料科学
氢
氢化物
溅射沉积
催化作用
扩散
薄膜
钛
溅射
图层(电子)
吸收(声学)
分析化学(期刊)
化学工程
无机化学
冶金
纳米技术
复合材料
合金
化学
有机化学
工程类
物理
热力学
金属
作者
Hwaebong Jung,Sungmee Cho,Wooyoung Lee
摘要
Here, we report the microstructural and hydrogen storage properties of a 40-layer film of Pd (x nm)/Ti (40 nm)/Mg (360 nm)/Ti (40 nm) (x = 0, 5, 10, and 20) fabricated using an ultra-high vacuum DC magnetron sputtering system. The superior hydrogen uptake of the Pd/Ti/Mg/Ti films was 6.42 wt. % for x = 10 at 150 °C. The hydrogen absorption time is strongly dependent on the Pd film thickness (0–40 nm). As a result, the Pd/Ti/Mg/Ti multilayer film with the Pd interlayer can be attributed to offer the further diffusion channels and the controlled growth rate of hydride formation at the Pd/Ti/Mg interfaces, which provides an overall enhancement of the hydrogen storage properties.
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