Characterization of CF4 Plasma-Treated Indium–Tin-Oxide Surfaces Used in Organic Light-Emitting Diodes by X-ray Photoemission Spectroscopy

The CF 4 plasma treatment of indium–tin-oxide (ITO) greatly improves the performance of organic light-emitting diodes (OLEDs). The effects of plasma treatment on the chemical composition change and device performance were investigated by X-ray photoemission spectroscopy (XPS). The present results suggest that fluorine directly bonded to indium or tin on the ITO surface and markedly enhanced device performance.