中间层
串扰
电阻抗
计算机科学
信号完整性
带宽(计算)
电子工程
电气工程
材料科学
互连
工程类
电信
图层(电子)
蚀刻(微加工)
复合材料
作者
Kuei-Ju Lin,Ruey‐Beei Wu
标识
DOI:10.1109/edaps53774.2021.9656991
摘要
This article aims to optimize the signal integrity of high-bandwidth memory (HBM) interconnects in silicon interposer layer that connect the memory and SoC (CPU, GPU). Based on the second-generation enhanced version of high-bandwidth memory (HBM2e), a new wiring layout with greatly reduced coupling coefficient is proposed to mitigate the crosstalk problems. Then, by taking advantage of mismatched source and load impedances, the optimized characteristic impedance of the interconnects is designed to achieve the best eye diagram for the latest third-generation high-bandwidth memory (HBM3). As a result, the eye opening of the original HBM2E can be improved from 11% to 51%, or 4.6 times improvement, for the high-speed transmission at 6.4GHz with risetime 15ps.
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