材料科学
硅
原电池
薄脆饼
纳米线
蚀刻(微加工)
金属
枝晶(数学)
各向同性腐蚀
纳米技术
冶金
化学工程
光电子学
图层(电子)
几何学
工程类
数学
作者
Pee‐Yew Lee,Hung Ji Huang,Tsung‐Shine Ko,Y.-C. Hung,Liyan Wu,Jiajun Fan,Yung‐Sheng Lin
出处
期刊:Journal of Manufacturing Science and Engineering-transactions of The Asme
[ASM International]
日期:2023-07-03
卷期号:145 (11)
被引量:3
摘要
Abstract The fluoride-assisted galvanic replacement reaction is a conventional method for fabricating metallic dendrites on silicon wafers. However, whether bubbles affect manufacturing metallic dendrites is unclear. This study investigated the effects of bubbles on manufacturing Au dendrites and silicon nanowires through metal-assisted chemical etching. The results of manufacture under three conditions (standard, shaking, and vacuum conditions) were compared. Synchronous growth of Au dendrites and silicon nanowires were observed on the silicon wafers. The Au dendrite deposition rate was higher than the silicon etching rate. Compared with the standard condition, the vacuum condition increased the synthesis rates of Au dendrites and silicon nanowires by 1.1 and 0.2 μm/min, respectively. Therefore, the elimination of bubbles by vacuum can considerably accelerate manufacturing Au dendrites and silicon nanowires.
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