High-performance Ga2O3 solar-blind UV photodetectors via film growth regulation and surface state engineering

Gallium oxide (Ga2O3) with a wide bandgap is emerging as one of the most promising candidates for solar-blind photodetectors (SBPDs). However, the practical application of Ga2O3-based SBPDs is impeded by substantial defects-related leakage currents, sluggish response speed, and high-cost, making their practical applications face great challenges. Here, we proposed strategic films growth regulation and surface state engineering to grow high-quality yet economical β-Ga2O3 films, thereby achieving high-performance SBPDs. High-resolution transmission electron microscopy revealed the presence of high-quality films with an extremely regular arrangement of β-Ga2O3 ( 01) planes. The full width at half maximum and root mean square roughness values are 0.07° and 0.716 nm, respectively. The β-Ga2O3 films demonstrated a significant reduction in VO concentrations after O2/N2 plasma treatment. This process can effectively minimize thermal damage to the sample surface while retaining highly reactive free radicals. The photocurrents of devices can be further enhanced, leading to larger PDCRs of 8.6×107, through N2 plasma treatment. Moreover, the films effectually suppress the persistent photoconductivity effect with τr and τd values of 5.31/0.97 s and 0.49/0.87 s before and after N2 plasma treatment, respectively. We have demonstrated the O2/N2 plasma treatment influence mechanism on photoelectronic performance. This study provides a practical approach to growing high-quality β-Ga2O3 films and preparing high-performance but low-cost Ga2O3-based SBPDs.