Enhanced strength of AlCoCrCu0.5FeNi high entropy alloy thin films reinforced by multi-phase hardening and nanotwins

材料科学 薄膜 退火(玻璃) 合金 复合材料 透射电子显微镜 硬化(计算) 氧化物 冶金 纳米技术 图层(电子)
作者
Zhong Zheng,Hong Zhao,Behnam Akhavan,Lixian Sun,Hongwei Liu,Kostadinos Tsoutas,Yanping Liu,Marcela Bilek,Zongwen Liu
出处
期刊:Materials Science and Engineering A-structural Materials Properties Microstructure and Processing [Elsevier BV]
卷期号:879: 145252-145252 被引量:5
标识
DOI:10.1016/j.msea.2023.145252
摘要

High entropy alloy (HEA) thin films have become increasingly popular because they exhibit favorable properties but with lower material consumption. Here, this research demonstrates that annealing of AlCoCrCu0.5FeNi thin films results in multiphase hardening and the formation of nanotwins. HEA thin films were atmospherically annealed at different temperatures (300 – 700 °C) for 5 h. A thin dense oxide layer consisting of Al2O3 and Cr2O3 appeared at the top surface of the 700 °C annealed film. This oxide layer endows the HEA thin film with excellent antioxidant properties. As such, vacuum and inert gas might not be required for HEAs annealing process at up to 700 °C. A phase transformation was observed in the film annealed at 700 °C for 5 h from X-ray diffraction patterns. Results from transmission Kikuchi diffraction and energy dispersive X-ray spectroscopy mapping indicated the formation of three new phases, including the FeCo phase, Cr-rich phase and Cu nano-clusters. Variations also happened in HEA FCC matrix where two types of texture existed in the HEA FCC grains i.e., {012} <110> and {112} <110>. Of particular interest was that high-resolution transmission electron microscopy revealed a high density of annealing nanotwins among the HEA FCC grains, including lamellar and co-axial twins. The influence of these structural phenomena on mechanical properties was evaluated. The results showed that the hardness and modulus of 700 °C annealed HEA thin film increased by 25% and 24% to 8.4 ± 0.2 GPa and 149.4 ± 6.1 GPa when compared to the properties of as-deposited films.

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