X射线光电子能谱
蚀刻(微加工)
反应离子刻蚀
钼
光电发射光谱学
离子
光谱学
化学
材料科学
干法蚀刻
分析化学(期刊)
无机化学
纳米技术
化学工程
物理
工程类
量子力学
色谱法
有机化学
图层(电子)
出处
期刊:Journal of vacuum science & technology
[American Vacuum Society]
日期:1987-09-01
卷期号:5 (5): 1372-1373
被引量:22
摘要
In this work, the reactive ion etching of Mo by SF6 and O2 has been investigated by studying the etching mec hanism. The etching species, etch products, and Mo surface analysis by x− ray photoemission spectroscopy (XPS or ESCA) and electron energy−loss spectroscopy (EELS) have been analyzed to b etter understand the etching mechanism. (AIP)
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