Rigorous 3D probabilistic computational lithography and chip-level inspection for EUV stochastic failure detection

Background: Natural physical phenomena occurring at length scales of a few nm produces variation in many aspects of the EUV photoresist relief image: edge roughness, width roughness, feature-tofeature variability, etc. 1,2,3,4. But the most damaging of these variations are stochastic or probabilistic printing failures 5, 6. Stochastic or probabilistic failures are highly random with respect to count and location and occur on wafers at spectra of unknown frequencies. Examples of these are space bridging, line breaking, missing and merging holes. Each has potential to damage or destroy the device, reducing yield 6, 10. Each has potential to damage or destroy the device, reducing yield 6, 10. The phenomena likely originates during exposure where quantized light and matter interact1 . EUV lithography is especially problematic since the uncertainty of energy absorbed by a volume of resist is much greater at 13.5 nm vs. 248 nm and 193 nm. Methods: In this paper, we use highly accelerated rigorous 3D probabilistic computational lithography and inspection to scan an entire EUV advanced node layout, predicting the location, type and probability of stochastic printing failures.