二氧化钛
材料科学
锐钛矿
薄膜
氧气
钛
吸收(声学)
沉积(地质)
分析化学(期刊)
相(物质)
波长
形态学(生物学)
金红石
光学
可见光谱
化学工程
吸收光谱法
氧化钛
极限氧浓度
物理气相沉积
光学涂层
光学显微镜
化学气相沉积
分压
气相沉积
折射率
氧气
光电子学
作者
Haleh Kangarlou,Somayeh Asgary
摘要
ABSTRACT Titanium dioxide (TiO 2 ) thin films were deposited on glass substrates under HV conditions at room temperature by the physical vapor deposition method. Produced titanium thin films were post‐annealed at 573 K at different oxygen flows (0, 9 and 23 cm 3 /s). The influence of different oxygen flows on nano‐structure, crystallography, and optical parameters of TiO 2 films was investigated by XRD, AFM, and spectrophotometer in the UV–VIS wavelength range. Other optical parameters were calculated using the Kramers‐Kronig computational method on reflectivity curves. The XRD pattern displays the anatase phase for TiO 2 thin films. With increasing oxygen flow, it became highly transparent in the visible range. It was found that the optical absorption decreased from the UV to near IR region. Various optical parameters such as n, k, σ 1 and σ 2 have been discussed.
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