Electrochemical deposition of aluminum oxide thin films from aqueous baths

Aluminum oxide thin films were successfully deposited onto transparent conductive fluorine-doped tin oxide (FTO) glass for the first time through a facile single-step potentiostatic electrochemical deposition. The precursor solution was deionized water containing aluminum sulfate and sodium thiosulfate. The Auger electron spectroscopy, scanning electron spectroscopy, and optical transmission and thickness measurements were performed for the deposited films. The films are highly transparent, and O/Al composition ratio is nearly unity.