有机场效应晶体管
帕利烯
并五苯
电介质
材料科学
电容
光电子学
栅极电介质
晶体管
场效应晶体管
电气工程
纳米技术
化学
工程类
薄膜晶体管
电压
电极
复合材料
聚合物
物理化学
图层(电子)
作者
Keith Behrman,Zhihua Zhu,Tian Sun,Marco Roberto Cavallari,Hang Li,Kalpathy B. Sundaram,Juin J. Liou,Ioannis Kymissis
标识
DOI:10.1109/ted.2021.3099458
摘要
We examine the electrostatic discharge (ESD) behavior of bottom-gate bottom-contact pentacene organic field-effect transistor (OFET) devices with a parylene-C gate dielectric. A comparison between devices with gate and contact overlap geometries of −2 to $3~\mu \text{m}$ are analyzed. In particular, the relationship between contact overlap, the protective effect of the increased overlap, and the electric field in the dielectric and their effect on ESD resilience is detailed. We find a markedly increased tolerance for negative contact overlaps and a small decrease in tolerance for more positive overlaps. We also report on a highly resilient effect where OFET devices continue to operate but with a reduction in performance after multiple dielectric breakdown. A negative overlap length should be carefully considered when designing OFET devices in a tradeoff between decreased performance and higher ESD resilience.
科研通智能强力驱动
Strongly Powered by AbleSci AI