高电子迁移率晶体管
跨导
互调
线性
材料科学
光电子学
功率密度
电压
功勋
击穿电压
电气工程
功率(物理)
晶体管
物理
放大器
量子力学
工程类
CMOS芯片
作者
Xiang Du,Min-Han Mi,Pengfei Wang,M. Lu,Yuwei Zhou,Can Gong,Xiaoping Ouyang,Xiaohua Ma,Yue Hao
摘要
In this work, an AlN/AlxGa1-xN/GaN graded channel HEMT (AlN. GC HEMT) with enhanced power and linearity performance has been proposed. With the adoption of a strong-polarized AlN barrier and a graded AlxGa1-xN channel, a current density of 1806 mA/mm and a transconductance (Gm) gate voltage swing (GVS-Gm) of 7 V were gained. At 3.6 GHz load pull measurements with a drain voltage (VDS) of 8 V, the AlN. GC HEMT exhibited a maximum output power density (Pout) of 2.2 W/mm. Two-tone intermodulation distortion measurement further revealed an output third-order intercept point (OIP3) of 35.5 dBm and a corresponding linearity figure of merit (OIP3/PDC) of 11.2 dB. The improved performance can be attributed to the hybrid 2DEG and 3DEG distribution in the channel, where the high density 2DEG contributes to a large output capacity, and the smooth 3DEG facilitates a sustained and stable charge accumulation with bias variation. These results indicate the potential of AlN. GC HEMT in 5G applications that target high power density and high linearity.
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