新型二维层状材料Mxenes (过渡金属碳化物或氮化物)因其具有与石墨烯类似的结构和丰富的物理化学性质,在储能、催化、光电、生物等领域具有巨大的潜在应用价值。但至今为止,关于MXenes的制备方法并不成熟。本文分别采用HF腐蚀液选择性刻蚀的方法制备了MXenes,通过扫描电子显微镜(SEM)、透射电子显微镜(TEM)、X射线衍射仪(XRD)等表征手段研究了HF的浓度、反应时间、反应温度等工艺因素对MXenes形貌和结构的影响。研究结果表明,用浓度50 wt%的HF在50℃下反应24 h,得到的层状MXenes最佳,将有助于进一步拓宽MXenes在多领域的应用。 The novel two dimensional material MXenes (early transition metal carbides and nitrides) exhibit rich physical and chemical properties like graphene, thus show a wide application in energy storage, catalyst, photoelectricity, biology, etc. But until now, the method fabricating MXenes is not mature. In this paper, we used HF to selectively etch out a layer in MAX phase for synthesizing MXene. Then with the help of the scanning electron microscopy (SEM), transmission electron microscopy (TEM) and X-ray diffraction (XRD), it is found that the HF concentration and system temperature can severely influence the morphology and structure of the obtained MXene. The results show that the perfect layered MXene can be synthesized used 50 wt% HF under 50℃ for 24 h, which will broaden the potential application of MXenes.