3D Photoprintable Antistatic Materials with Polymerizable Deep Eutectic Solvents

With the development of 3D printing technology, the desire to apply this technology in terminal part manufacturing is becoming increasingly urgent. Therefore, the performance and functional requirements of 3D printing materials are constantly evolving. Here, we have designed 3D photoprintable inks based on a polymerizable deep eutectic solvent (DES) combining acrylic acid (AA) and choline chloride (ChCl). The photocurable inks show fast curing speeds that were confirmed by real-time studies, and the printed parts have moderate strength and relatively good flexibility due to the addition of AA/ChCl-type DESs. Moreover, the addition of AA/ChCl endows the printed object with an excellent permanent antistatic effect, demonstrating that the surface resistivity of printed films is reduced to 106–10 Ω with different amounts of AA/ChCl. The antistatic effect is also maintained with low temperature (−15 °C), long storage time, and repeated alcohol surface washing. Furthermore, we have successfully printed various complicated transparent objects, indicating that AA/ChCl is uniformly embedded into the polymer network. We believe that the introduction of polymerizable DESs into 3D photoprintable inks provides a low-cost strategy for fabricating transparent, permanent, and stretchable antistatic materials for various applications.