图层(电子)
材料科学
二硼化锆
锆
氧气
化学工程
碳化硅
复合材料
冶金
化学
工程类
有机化学
作者
William G. Fahrenholtz
标识
DOI:10.1111/j.1551-2916.2006.01329.x
摘要
A thermodynamic model was developed to explain the formation of a SiC‐depleted layer during ZrB 2 –SiC oxidation in air at 1500°C. The proposed model suggests that a structure consisting of (1) a silica‐rich layer, (2) a Zr‐rich oxidized layer, and (3) a SiC‐depleted zirconium diboride layer is thermodynamically stable. The SiC‐depleted layer developed due to active oxidation of SiC. The oxygen partial pressure in the SiC‐depleted layer was calculated to lie between 4.0 × 10 −14 and 1.8 × 10 −11 Pa. Even though SiC underwent active oxidation, the overall process was consistent with passive oxidation and the formation of a protective surface layer.
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