解耦(概率)
电子线路
静电放电
电容器
电子工程
去耦电容器
集成电路
可靠性(半导体)
CMOS芯片
电气工程
电容
材料科学
工程类
功率(物理)
电压
物理
量子力学
控制工程
电极
作者
Vrashank Shukla,Nathan Jack,Elyse Rosenbaum
出处
期刊:International Reliability Physics Symposium
日期:2010-05-02
被引量:31
标识
DOI:10.1109/irps.2010.5488782
摘要
Power domain crossing circuits, also known as internal I/O's, are susceptible to gate oxide damage during charged device model (CDM) events. Circuit-level simulations of internal I/O circuits along with elements representing the package, electro-static discharge (ESD) circuits and the substrate, elucidate the roles of the package, power clamp placement, back-to-back diode placement and the decoupling capacitors in determining the amount of stress at the internal I/O circuits. This paper presents an internal I/O model that can be used for CDM simulations. The effects of power and ground bus resistance, substrate resistivity, decoupling capacitance, local ESD clamp at the gate of the receiver and the presence of local back-to-back diodes are investigated. The paper further contains design recommendations for preventing CDM failures in the internal I/O circuits.
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