放大器
CMOS芯片
NMOS逻辑
材料科学
线性
物理
电气工程
互调
光电子学
晶体管
电压
工程类
作者
Jihoon Kang,Dihua Yu,Youngoo Yang,Bumman Kim
出处
期刊:IEEE Journal of Solid-state Circuits
[Institute of Electrical and Electronics Engineers]
日期:2006-04-28
卷期号:41 (5): 1073-1080
被引量:47
标识
DOI:10.1109/jssc.2006.874059
摘要
The linearity of a 0.18-/spl mu/m CMOS power amplifier (PA) is improved by adopting a deep n-well (DNW). To find the reason for the improvement, bias dependent nonlinear parameters of the test devices are extracted from a small-signal model and a Volterra series analysis for an optimized nMOS PA with a proper matching circuit is carried out. From the analysis, it is revealed that the DNW of the nMOS lowers the harmonic distortion generated from the intrinsic gate-source capacitance (C/sub gs/), which is the dominant nonlinear source, and partially from drain junction capacitance (C/sub jd/). Single-ended and differential PAs for 2.45-GHz WLAN are designed and fabricated using a 0.18-/spl mu/m standard CMOS process. The single-ended PA with the DNW improves IMD3 and IMD5 about 5 dB with identical power performances, i.e., 20 dBm of P/sub out/, 18.7 dB of power gain and 31% of power-added efficiency (PAE) at P/sub 1dB/. The IMD3 and IMD5 are below -40 dBc and -47dBc, respectively. The differential PA with the DNW also shows about 7 dB improvements of IMD3 and IMD5 with 20.2 dBm of P/sub out/, 18.9 dB of power gain and 35% of PAE at P/sub 1dB/. The IMD3 and IMD5 are below -45 dB and -57 dBc, respectively. These performances of the linear PAs are state-of-the-art results.
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