X射线光电子能谱
碲化镉光电
兴奋剂
电阻率和电导率
氮气
材料科学
化学气相沉积
分析化学(期刊)
退火(玻璃)
光电子学
化学
化学工程
冶金
电气工程
工程类
有机化学
色谱法
作者
Bettina Späth,J. Fritsche,Andreas Klein,Wolfram Jaegermann
摘要
The properties of nitrogen doped ZnTe films and in situ formed heterointerfaces to CdTe were investigated using photoelectron spectroscopy and electrical measurements. The p doping of ZnTe with nitrogen is controlled during physical vapor deposition with an additional nitrogen plasma source. The resistivity was determined by four-point measurements and a minimum resistivity of ρ=0.04Ωcm was found. The valence band offset of the CdTe∕ZnTe interface is EVBO=0.05eV.
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