材料科学
小旋翼机
纳米复合材料
光刻胶
纳米孔
平版印刷术
超材料
复合材料
光电子学
等离子体子
吸收(声学)
聚合物
退火(玻璃)
干涉光刻
纳米技术
纳米颗粒
纳米光刻
弹性模量
纳米压印光刻
光子超材料
透射率
银纳米粒子
光刻
蜂窝结构
抵抗
去湿
X射线光刻
光学
热能
辅助
超细纤维
作者
Samantha Cheung,Daniel Delghandi,Chaolumen Wu,Yu‐Hao Peng,Paul C. Martin,X. Wendy Gu
标识
DOI:10.1002/adma.202521526
摘要
ABSTRACT Nanostructured metamaterials with complex 3D geometries can be fabricated using two‐photon lithography but are typically limited to specific materials by the available photoresists. Here, we develop a two‐photon lithography photoresist for fabricating mechanically robust and optically active metamaterials. This photoresist consists of silver nanocluster photointiators in a polyhedral oligomeric silsequioxane (POSS) polymer matrix. Printed nanocomposites show a 216% increase in elastic modulus and 166% increase in energy absorption compared to structures made of POSS, while retaining 96% elastic recovery. Nanocomposite gyroid nanolattices reach 80% strain at failure. The nanolattice energy absorption is among the highest for lightweight nanoporous materials. Thermal annealing is used to convert the printed nanocomposites to nanoparticle‐embedded glass with 54% higher energy absorption than fused silica. The annealed gyroid nanolattices contain silver nanoparticles and exhibit plasmonic activity. Right and left‐handed chiral nanolattices result in different transmission spectra under linearly polarized light.
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