钝化
材料科学
光电子学
原子层沉积
氮化物
蚀刻(微加工)
各向同性腐蚀
二极管
发光二极管
量子效率
图层(电子)
干法蚀刻
化学气相沉积
纳米技术
作者
Matthew S. Wong,Changmin Lee,Daniel J. Myers,David Hwang,Jared A. Kearns,Thomas Li,James S. Speck,Shuji Nakamura,Steven P. DenBaars
标识
DOI:10.7567/1882-0786/ab3949
摘要
Micro-light-emitting-diodes (μLEDs) with size-independent peak external quantum efficiency behavior was demonstrated from 10 × 10 μm2 to 100 × 100 μm2 by employing a combination of chemical treatment and atomic-layer deposition (ALD) sidewall passivation. The chemical treatment and sidewall passivation improved the ideality factors of μLEDs from 3.4 to 2.5. The results from the combination of chemical treatment and ALD sidewall passivation suggest the issue of size dependent efficiency can be resolved with proper sidewall treatments after dry etching.
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