Plasma Nitriding of ISO 5832-1 Stainless Steel with Intermittent Nitrogen Flow at 450°C

ISO 5832-1 stainless steel specimens were plasma nitrided at different nitrogen potentials. The main goal was to obtain the S-phase with different nitrogen concentrations and free of chromium-based precipitates. The control of nitrogen potential was made by pulsing the gas at predetermined times: 10/10, 05/15, 02/18, and 01/19, where the numbers represent the time in minutes that the nitrogen flow was kept on/off, respectively. For all pulsing conditions, the nitriding was carried out at 450 °C for 2 hours. After nitriding, specimens were characterized by means of optical (OM) and electron microscopy (SEM), energy-dispersive spectroscopy (EDS), X-ray diffraction (XRD) and microhardness. Results show that the nitrided layer thickness decreases with decreasing times of nitrogen pulse, and that lower times of nitrogen flow lead to lower precipitation of chromium nitrides. It can be thus concluded that the use of intermittent nitrogen flow is an alternative to control the nitrided layer in terms of thickness, hardness, and the amount of nitrogen present in phase ɣN (S-phase).