放大器
电气工程
异质结双极晶体管
宽带
材料科学
晶体管
光电子学
物理
计算机科学
工程类
电信
双极结晶体管
电压
CMOS芯片
作者
Thomas Bücher,Janusz Grzyb,Philipp Hillger,H. Rücker,B. Heinemann,Ullrich R. Pfeiffer
出处
期刊:IEEE Journal of Solid-state Circuits
[Institute of Electrical and Electronics Engineers]
日期:2022-04-08
卷期号:57 (7): 2024-2034
被引量:42
标识
DOI:10.1109/jssc.2022.3162079
摘要
A broadband three-stage pseudo-differential SiGe-interconnection bipolar transistor (HBT) power amplifier (PA) for high-speed communication at around 300 GHz is presented. The amplifier is fabricated in an experimental 130-nm SiGe BiCMOS technology with an $f_{t}/f_{\max }$ of 470/650 GHz. The use of asymmetric coupled line transformers is proposed to facilitate broadband impedance transformation with device reactance compensation at all amplifier interfaces. The amplifier achieves a maximum small-signal power gain of 23.0 dB and a $P_{\mathrm{ sat}}/{\mathrm{ OP}}_{\mathrm{ 1\,dB}}$ up to 9.7/6.7 dBm, respectively. It shows a 3-dB bandwidth of 63 GHz (239–302 GHz) in small-signal operation and 94 GHz (223–317 GHz) when saturated. The amplifier consumes about 360 mW at a 3-V supply voltage yielding a peak power-added efficiency (PAE) of 1.95% at 260 GHz.
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