12‐1: Controlling the Pixel Colors of Quantum Dot Thin Films by Patterning the Substrates

The common methods to achieve high resolution of patterned QD thin films are photolithography of QD thin films and ink‐jet printing of QD thin films. To avoid damages on QDs caused by photolithography and further increase the resolution of the patterned QD, a new method, i.e. selective extraction of lightemission by patterning the bottom electrode instead, was developed in this work. The theory of this method is based on optical interference. Patterning the ITO substrates offers more flexibility and higher resolution, since ITO is more robust and resistive to damages related to photolithography.