极端紫外线
光学
材料科学
反射计
紫外线
波长
衍射
X射线光学
软X射线
溅射
X射线
光电子学
薄膜
物理
激光器
纳米技术
时域
计算机科学
计算机视觉
作者
Claude Montcalm,Patrick A. Kearney,J. M. Slaughter,Brian Sullivan,Mohamed Chaker,H. Pépin,Charles M. Falco
出处
期刊:Applied optics
[The Optical Society]
日期:1996-09-01
卷期号:35 (25): 5134-5134
被引量:82
摘要
We have performed an experimental investigation of Ti-, B4C-, B-, and Y-based multilayer mirrors for the soft x-ray–extreme ultraviolet (XUV) wavelength region between 2.0 and 12.0 nm. Eleven different material pairs were studied: Ti/Ni, Ti/Co, Ti/Cu, Ti/W, B4C/Pd, B/Mo, Y/Pd, Y/Ag, Y/Mo, Y/Nb, and Y/C. The multilayers were sputter deposited and were characterized with a number of techniques, including low-angle x-ray diffraction and normal incidence XUV reflectometry. Among the Ti-based multilayers the best results were obtained with Ti/W, with peak reflectances up to 5.2% at 2.79 nm at 61° from normal incidence. The B4C/Pd and B/Mo multilayer mirrors had near-normal incidence (5°) peak reflectances of 11.5% at 8.46 nm and 9.4% at 6.67 nm, respectively, whereas a Y/Mo multilayer mirror had a maximum peak reflectance of 25.6% at 11.30 nm at the same angle. The factors limiting the peak reflectance of these different multilayer mirrors are discussed.
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