Defects in Semiconductors: Some Fatal, Some Vital

掺杂剂 半导体 材料科学 兴奋剂 杂质 钝化 亚稳态 化学物理 纳米技术 工程物理 凝聚态物理 光电子学 化学 物理 有机化学 图层(电子)
作者
H. J. Queisser,Eugene E. Haller
出处
期刊:Science [American Association for the Advancement of Science]
卷期号:281 (5379): 945-950 被引量:520
标识
DOI:10.1126/science.281.5379.945
摘要

REVIEW The role of defects as essential entities in semiconductor materials is reviewed. Early experiments with semiconductors were hampered by the extreme sensitivity of the electronic properties to minute concentrations of impurities. Semiconductors were viewed as a family of solids with irreproducible properties. Scientific efforts overcame this idiosyncrasy and turned the art of impurity doping into today's exceedingly useful and reproducible technology that is used to control precisely electrical conductivity, composition, and minority-carrier lifetimes over wide ranges. Native defects such as vacancies and self-interstitials control basic processes, foremost self- and dopant diffusion. The structural properties of dislocations and higher dimensional defects have been studied with atomic resolution, but a thorough theoretical understanding of their electronic properties is incomplete. Reactions between defects within the host lattices are increasingly better understood and are used for gettering and electrical passivation of unwanted impurities. Metastable defects such as DX centers and the EL2-related arsenic antisite are briefly discussed. The recent development of isotopically controlled semiconductors has created new research opportunities in this field.
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