材料科学
表征(材料科学)
纳米复合材料
纳米技术
工程物理
工程类
作者
Naseem Akhtar,Malika Rani,Aqeel Ahmed Shah,A. Ibrahim,Mika Sillanpää,Mohamed Ouladsmane,Kashmala Tariq
标识
DOI:10.1149/2162-8777/ad4ff1
摘要
Here we present the fabrication of a multilayer resistive memory device (ReRAM) utilizing AlCr 2 O 4 /MXene nanocomposite. Comprehensive investigations into the structural and morphological properties of the nanostructures were conducted using various characterization techniques. The fabricated device was tested by measuring I-V characteristics at different current applications which encompasses all previous results. The band gap value for the nanocomposite was reduced to 2.42 eV while that for AlCr 2 O 4 was measured at 3.25 eV via photoluminescence spectrum. Average particle size of the AlCr 2 O 4 /MXene nanocomposite was determined to be 25 nm through powder X-ray diffraction analysis. Crystallographic analysis revealed that all crystal peaks conform to the R-3c (167) space group, indicative of a standard hexagonal crystal structure. Energy-dispersive X-ray readings provided further confirmation that all required elements are present in the sample, affirming successful synthesis of the nanocomposite. Notably, the nanocomposite demonstrated exceptional performance as an electrode material in ReRAM, as evidenced by its current-voltage characteristics, making the AlCr 2 O 4 /MXene nanocomposite suitable for a wide range of next-generation device applications.
科研通智能强力驱动
Strongly Powered by AbleSci AI