成核
位错
材料科学
凝聚态物理
磁畴壁(磁性)
透射电子显微镜
领域(数学分析)
结晶学
纳米技术
复合材料
磁化
物理
磁场
化学
数学
数学分析
热力学
量子力学
作者
Tianshu Jiang,Fan Ni,Oscar Recalde‐Benitez,Patrick Breckner,Leopoldo Molina‐Luna,Fangping Zhuo,Jürgen Rödel
摘要
Electro-mechanical interactions between topological defects and domain walls play a key role in the macroscopic response of bulk and thin-film ferroelectrics. The applications of ferroelectrics are derived from their inherent ability to nucleate new domains and to move the domain walls that separate adjacent domains. Here, we report dislocation-mediated domain nucleation in single-crystal BaTiO3, achieved by dislocations generated via high-temperature uniaxial compression on a notched sample. We also present a direct observation of domain-wall pinning of 90° ferroelastic domain walls by dislocations using in situ transmission electron microscopy. Dense and well-aligned “forest” dislocations, featuring {100}⟨100⟩ slip systems oriented in the out-of-plane [001] direction, exclusively nucleate in-plane domain variants. We reveal that the 90° domain walls are strongly pinned by imprinted dislocations due to the presence of their associated stress fields. Our findings may advance our understanding of the control of defects in ferroelectrics and propose a strategy applicable to both emerging nanoelectronic and bulk applications.
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