Planar Magnetron Sputtering System with Electron Injection and Reflecting Electrode

The features of the operation of a discharge system based on a planar magnetron with additional electron injection and a conical reflecting electrode are studied. Electrons are injected from a glow discharge with a hollow cathode placed on the back side of the target. The magnetron discharge target with a diameter of 125 mm was made of copper. The pressure of the working gas (argon) varied in the range from 3 to 0.5 mTorr. The discharges functioned in a continuous mode. The results of the effect of the reflecting electrode on the radial uniformity of the generated plasma, as well as the degree of its sputtering, are presented. The radial uniformity and the surface and phase structure of copper films formed when the working pressure decreases down to the lowest possible value (0.5 mTorr) are studied.