异质结
材料科学
响应度
成核
光电探测器
范德瓦尔斯力
光电子学
外延
透射电子显微镜
带隙
钝化
电子能带结构
密度泛函理论
纳米技术
扫描透射电子显微镜
工作(物理)
晶格常数
低能电子显微镜
光学
晶格平面
作者
Mengmeng Yang,Shijuan Ran,Shangyu Dai,Jianjun Qiu,Xueting Liu,Qunrui Deng,Haiyuan Chen,Zhixin Luo,Huawen Quan,Nengjie Huo,Jun Liu,Wenlong Chen,Zhaoqiang Zheng,Zuxin Chen,Wei Gao
出处
期刊:Nano Letters
[American Chemical Society]
日期:2026-09-19
标识
DOI:10.1021/acs.nanolett.6c03380
摘要
Abstract Precise heteroepitaxial control in van der Waals (vdW) heterostructures remains a challenge. Here, we demonstrate a visualized and directed heteroepitaxy strategy for GeSe on WSe2 by integrating in situ imaging with symmetry-guided physical vapor deposition. Real-time observation captures the nucleation kinetics and orientation evolution, accelerating process optimization. Combined density functional theory calculations and transmission electron microscope characterizations identify a preferential epitaxial angle of 20° (occurrence: 59.37%) for most GeSe nanosheets, corresponding to the global energy minimum governed by lattice symmetry. Coverage-tunable photodetectors are constructed by modulating GeSe nanosheets’ number, delivering a three-orders-of-magnitude enhancement in responsivity at 808 nm (823.8 A/W at maximum coverage). This is attributed to optimized light harvesting in GeSe and a photogating effect via back-to-back type-II band alignment. High-contrast single-pixel imaging is also demonstrated. This work establishes a paradigm for visualized synthesis and performance optimization of monochalcogenide-based vdW heterostructures.
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