材料科学
折射率
小型化
光电子学
纳米光子学
光学
超材料
等离子体子
电介质
相(物质)
堆积
红外线的
吸收(声学)
纳米技术
物理
化学
有机化学
核磁共振
复合材料
作者
Zhilin Chen,Yuxin Jiang,Hui Xiong,Ruochen Xin,Wenjing Ding,Junhua Gao,Hongtao Cao
标识
DOI:10.1002/lpor.202400994
摘要
Abstract Fabry‐Pérot (FP) photonic absorbers have demonstrated their subwavelength thickness and integration convenience. However, without introducing abnormal phase shifts, it is hard to further miniaturize the FP absorbers. Herein, based on perfect optical phase‐matching, planar FP infrared (IR) absorbers can be more significantly thinned via ultrahigh refractive index (RI) artificial films, breaking the conventional quarter‐wavelength cavity limitation. Specifically, an ultrahigh RI (≈6.0) Ag nanowire‐Si metamaterial dielectric‐cavity covered by a giant RI (≈11.0) bismuth‐based absorbing layer is proposed to induce exceptional propagation phase accumulation and reflection phase shift. The resultant 155 nm FP absorber (not including the mirror layer) can support a resonance absorption at ≈4.4 µm. After vertically stacking, double‐cavity absorbers (below 310 nm) with multi‐resonant features are achieved, yielding broadband absorption from 1.4 to 14.4 µm. In addition, the whole FP absorbers are fabricated only through a sputtering process without any other procedures. In terms of optical phase management and refractive index engineering, this work creates a novel miniaturization scheme for FP infrared absorbers, offering a lot of opportunities applied in advanced nanophotonics.
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