劈理(地质)
材料科学
结晶学
沟槽(工程)
GSM演进的增强数据速率
平行六面体
凝聚态物理
几何学
化学
复合材料
冶金
物理
电信
断裂(地质)
计算机科学
数学
作者
Toshinori Taishi,Nagao Kobayashi,Etsuko Ohba,K. Hoshikawa
标识
DOI:10.35848/1347-4065/acc951
摘要
Abstract We conducted an investigation of line-shaped defects, extending in the 〈010〉 direction, in bulk β -Ga 2 O 3 single crystals grown by the vertical Bridgman (VB) method. Parallelepiped cross-section samples with {010} polished surfaces and {100} cleavage planes were prepared and were then etched in phosphoric acid at 140 °C. Rhombic etch pits were observed on the (010) surface and they were similar in shape to those reported as nanometer-sized grooves or plate-like nanopipes in crystals grown by the edge-defined film-fed growth (EFG) method. Groove-like voids in the 〈010〉 direction were also observed on {100} cleavage planes below the etch pits observed on the {010} surface. Therefore, we concluded that line-shaped defects observed in VB-grown crystals are similar to defects observed in EFG-grown crystals. The size of these defects was considerably smaller than that observed in EFG-grown crystals, but with a density of 5 × 10 5 cm −2 . Based on these results, possible formation mechanisms for such defects were discussed.
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