肖特基二极管
肖特基势垒
金属半导体结
材料科学
兴奋剂
光电子学
二极管
电压
p-n结
宽禁带半导体
半导体
电气工程
工程类
作者
Junbo Park,Kun-Sik Park,Jong-Il Won,Ki-hwan Kim,Sang‐Mo Koo,Sang‐Gi Kim,Jae‐Kyoung Mun
摘要
We present numerical simulation results and experimental measurements that explain the physical mechanism behind the high critical voltage, Vcrit, required to turn on a pn junction in a merged PiN Schottky (MPS) diode. The 2D simulation of potential distribution within a unit MPS cell demonstrated that the potential gradient set by the Schottky junction raises the potential barrier formed at the pn junction, thereby increasing Vcrit. Based on this knowledge, we propose that changing the ratio of the Schottky contact and the p+ region area, as well as shallow p-doping of the Schottky interface, can be used to control the magnitude of Vcrit. We present simulation and measurement results that demonstrate the feasibility of our approach.
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