NMOS逻辑
符号
数学
算法
计算机科学
电气工程
晶体管
电压
算术
工程类
作者
Kai Yu,Yangrun Zhou,Sizhen Li,Mo Huang
出处
期刊:IEEE Transactions on Circuits and Systems Ii-express Briefs
[Institute of Electrical and Electronics Engineers]
日期:2022-07-04
卷期号:69 (11): 4213-4217
被引量:17
标识
DOI:10.1109/tcsii.2022.3188451
摘要
This brief presents an NMOS-only voltage reference with small process variations for ultra-low-power applications. All MOSFETs work in the subthreshold region and are biased by the leakage current of the NMOS transistor manufactured in Deep-N-Well (DNW). By fitting the variations of threshold voltage ( $\text{V}_{\mathrm{ TH}}$ ) from slow/fast corners to typical corners linearly, an optimum body selection (OBS) is proposed to reduce the impact of the process variations from $\text{V}_{\mathrm{ TH}}$ or $\Delta \text{V}_{\mathrm{ TH}}$ with the aid of the body effect. The proposed design was fabricated in a 0.18- $\mu \text{m}$ CMOS process, together with a baseline design without using the OBS. Based on the 25-chip measurement results, the output voltage variation of the proposed design is $0.0035 \sigma /\mu $ , which is 61% smaller than that of the baseline design. Besides, for the proposed design with the OBS, the power consumption is 23pW (27°C), while the die area is 0.003mm2. The temperature coefficient is 52ppm/°C in a temperature range from 0°C to 85°C without trimming. The line sensitivity is 0.03%/V, and the power supply rejection ratio is 47dB at 100Hz.
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