Effect of methyltrimethoxysilane hydrolysis and condensation conditions on the properties of thin polymethylsilsesquioxane films

We have studied the influence of methyltrimethoxysilane hydrolysis and condensation conditions in aprotic solvents on the formation, composition, and properties of thin polymethylsilsesquioxane films. The condensation of silanol groups and the structuring of the silicon–oxygen skeleton at different heat-treatment temperatures have been investigated by IR spectroscopy. The dielectric permittivity k and refractive index n of the films have been determined as functions of annealing temperature t a: at t a = 430°C, k = 2.75 and n = 1.38.