Microwave plasma torch abatement of NF3 and SF6

An atmospheric pressure microwave plasma torch as a tool for fluorinated compounds (FCs) abatement was presented. Detailed experiments were conducted on the abatement of NF3 and SF6 in terms of destruction and removal efficiency (DRE) using Fourier transform infrared (FTIR). Swirl gas, compressed air for stable plasma, was tangentially injected into the microwave plasma torch and a mixture of N2, NF3, or SF6, and C2H4 was axially injected. The DRE of 99.1% for NF3 was achieved without an additive gas at the total flow rate of 50.1 liters per minute (lpm) by applying a microwave power of 1.4kW. Also, a DRE of SF6 up to 90.1% was obtained at the total flow rate of 40.6lpm using an applied microwave power of 1.4kW. Experimental results indicate that the microwave plasma abatement device can successfully eliminate FCs in the semiconductor industry.